The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2004
Filed:
Jan. 03, 2002
Chih-Yuan Hsiao, Feng-Shan, TW;
United Microelectronics Corp., Hsin-Chu, TW;
Abstract
A method for forming transistors static-random-access-memory. The method comprises the steps of: providing a substrate which at least comprises a cell area and periphery area, wherein the cell area comprises a first P-type region, a second P-type region, a first N-type region and a second N-type region, the periphery area comprises numerous periphery P-type regions and numerous periphery N-type regions; covering the first P-type region, the second P-type region and the periphery P-type regions by a first photoresist; forming numerous N-type sources and numerous N-type drains in the first P-type region, the second P-type region and the periphery P-type regions. Remove the first photoresist. Use a second photoresist to cover the periphery N-type regions and some the N-type drains which are located in both the first N-type region and the second N-type regions; and performing a large angle implanting process to form numerous P-type enlarged drains and numerous P-type region and the P-type second region, wherein numerous P-type extra sources also are formed on outside of some the N-type drains which are located in both the first N-type region and the second N-type region.