The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2004
Filed:
Oct. 29, 2001
Bing Ji, Allentown, PA (US);
Robert Gordon Ridgeway, Quakertown, PA (US);
Eugene Joseph Karwacki, Jr., Orefield, PA (US);
Howard Paul Withers, Jr., Breinigsville, PA (US);
Steven Arthur Rogers, Seoul, KR;
Peter James Maroulis, Mertztown, PA (US);
John Giles Langan, Pleasanton, CA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
An on-line halogen analyzer system and method of use for semiconductor processing effluent monitoring. The system includes sampling the effluent stream into an absorption cell, and passing UV-Visible light through the effluent sample in the cell. After passing through the sample the light is collected by a photo detector for real-time wavelength-selective absorption analysis. The system provides simultaneous determination of the concentrations of multiple halogen gases (e.g. F , Cl , Br , and I ) in semiconductor processing effluent streams. The invention can be used for chemical vapor deposition (CVD) chamber cleaning endpoint determination and to improve fluorine utilization efficiency in remote plasma downstream CVD chamber cleaning processes.