The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2003
Filed:
Oct. 10, 2000
Applicant:
Inventors:
Boudewijn Gijsbert Sluijk, Eindhoven, NL;
Christianus Gerardus Maria De Ridder, Hoogland, NL;
Assignee:
ASM International N.V., Bilthoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B65G 4/907 ;
U.S. Cl.
CPC ...
B65G 4/907 ;
Abstract
Installation for treatment of wafers in a reactor. To that end a series of wafers is placed in a wafer rack and fed into the reactor. Transport into and out of the reactor, which is sited in an enclosed chamber, takes place with the aid of conveyor means. The wafers are transferred from the wafer rack to one or more cassettes. During this operation the wafer rack is always in the vertical position, that is to say the wafers are horizontal. The same preferably also applies to the cassettes, so that the wafers remain horizontal throughout the entire process.
Published as:
NL1008143C2; WO9938199A1; AU2301699A; EP1057212A1; TW429505B; KR20010034389A; JP2002502112A; KR100375977B1; JP3399464B2; US6663332B1; EP1057212B1; DE69916035D1; DE69916035T2;