The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2003
Filed:
Jun. 21, 2001
Applicant:
Inventor:
Takahiro Horiguchi, Tsukui-gun, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; H05H 1/00 ;
U.S. Cl.
CPC ...
C23C 1/600 ; H05H 1/00 ;
Abstract
A single-substrate-processing apparatus includes an airtight process chamber in which a ceramic worktable is supported by a ceramic pedestal. The bottom of the pedestal is provided with a flange, which is attached to the bottom of the process chamber by a flange holder. The flange holder has upper and lower frames sandwiching the flange therebetween. The flange holder is detachably fixed by fixing bolts to the bottom of the process chamber from outside the process chamber.
Horiguchi, Takahiro. (2003). Single-substrate-processing apparatus for semiconductor process (U.S. Patent No. 6660097). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6660097
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile