The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2003

Filed:

Jun. 17, 2002
Applicant:
Inventor:

Jaime Poris, Boulder Creek, CA (US);

Assignee:

Nanometrics Incorporated, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 2/186 ;
U.S. Cl.
CPC ...
G01N 2/186 ;
Abstract

A confocal displacement sensor uses one or two light sources and produces two spots on a sample surface. The reflected intensities from the two spots are detected and measured by one or two detectors. A vertical resolution enhancement can be implemented by modifying the properties of the objective and/or detector lenses. The resultant height profile does not need to be corrected for tilt as is common with all single point surface measurement techniques. A differential scan can be performed with the two spots relatively close together to generate the slope of the height profile. Integrating this profile yields the height profile of the scan. A referential scan can be performed by scanning the reference point across an area of constant height and the measurement point scanned across the feature to be measured to directly generate the height profile.


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