The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2003
Filed:
Jun. 14, 2001
Applicant:
Inventors:
Stuart D. Hellring, Pittsburgh, PA (US);
Colin P. McCann, Pittsburgh, PA (US);
Charles F. Kahle, Pittsburgh, PA (US);
Yuzhuo Li, Potsdam, NY (US);
Jason Keleher, Schenectady, NY (US);
Assignee:
PPG Industries Ohio, Inc., Cleveland, OH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G09G 1/02 ; G09G 1/07 ;
U.S. Cl.
CPC ...
G09G 1/02 ; G09G 1/07 ;
Abstract
This invention relates to a slurry composition and a method of its preparation. In particular, the slurry composition of the present invention includes a silica wherein the silica comprises a surface modification. The silica-based slurry of the present invention is suitable for polishing articles and especially useful for chemical-mechanical planarization (“CMP”) of semiconductor and other microelectronic substrates.