The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2003
Filed:
May. 03, 2001
Praveen Chaudhari, Briarcliff Manor, NY (US);
James P. Doyle, Bronx, NY (US);
Shui-Chih Lien, Briarcliff Manor, NY (US);
Minhua Lu, Mohegan Lake, NY (US);
James L. Speidell, Poughquag, NY (US);
Robert J. Von Gutfeld, New York, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A self-alignment process for the precise alignment in a deposited diamond-like carbon (DLC), which results in a wider viewing angle for the display being manufactured. The process involves ion bombardment, which is swept across the liquid crystal panel in a two-pass process. In one embodiment, both ion sweeps are aligned at a 45-degree angle with respect to the bottom edge of the panel. The first pass is accomplished without any electrical bias on the panel. During the first pass the impinging ions may be at an angle with respect to a point on a plane defined by the surface of the panel that is less than 90 degrees. The second ion sweep is accomplished with the impinging ions at a second angle, greater than 90 degrees up to 180 degrees with respect to the point on the plane defined by the surface.