The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2003
Filed:
Jan. 16, 2002
Khoi A. Phan, San Jose, CA (US);
Jeffrey Erhardt, San Jose, CA (US);
Jerry Cheng, Milpitas, CA (US);
Richard J. Bartlett, Bonny Doon, CA (US);
Anthony P. Coniglio, San Jose, CA (US);
Wolfram Grundke, Dresden, DE;
Carol M. Bradway, Austin, TX (US);
Daniel E. Sutton, Austin, TX (US);
Martin Mazur, Pulsnitz, DE;
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
Methods and systems are disclosed for reducing resist residue defects in a semiconductor manufacturing process. The methods comprise appropriate adjustment of hardware, substrate, resist, developer, and process variables in order to remove resist residues from a semiconductor substrate structure in order to reduce resist residue defects therein. The method may comprise employing an anti reflective coating prior to applying a photo resist coating in a semiconductor manufacturing process. Also disclosed are methodologies for exhausting resist residue during development via a rinsing fluid.