The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2003
Filed:
Feb. 23, 2000
Applicant:
Inventors:
Izuru Matsuda, Kadoma, JP;
Hideo Haraguchi, Toyonaka, JP;
Takuya Matsui, Matsubara, JP;
Shigeyuki Yamamoto, Nara, JP;
Assignee:
Matsushita Electric Industrial Co., Ltd., Osaka-fu, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; H05H 1/00 ;
U.S. Cl.
CPC ...
C23C 1/600 ; H05H 1/00 ;
Abstract
A plasma processing apparatus includes a vacuum chamber for evacuating gas therefrom, for introducing reaction gas therein, and for generating plasma therein through high frequency power application. A substrate hold stage is set in the vacuum chamber, with the substrate hold stage including a set face having a recessed part, wherein a rear face of a substrate to be subjected to plasma processing is held on the set face.