The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2003
Filed:
Aug. 14, 2001
Applicant:
Inventors:
Takanobu Takeda, Kubiki-mura, JP;
Osamu Watanabe, Kubiki-mura, JP;
Kazuhiro Hirahara, Kubiki-mura, JP;
Kazunori Maeda, Kubiki-mura, JP;
Wataru Kusaki, Kubiki-mura, JP;
Shigehiro Nagura, Kubiki-mura, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 1/73 ; G03F 7/039 ; G03F 7/20 ; G03F 7/30 ; G03F 7/38 ; G03F 7/40 ;
U.S. Cl.
CPC ...
G03C 1/73 ; G03F 7/039 ; G03F 7/20 ; G03F 7/30 ; G03F 7/38 ; G03F 7/40 ;
Abstract
A ternary copolymer of hydroxystyrene, tertiary alkyl (meth)acrylate and substitutable phenoxyalkyl (meth)acrylate having a Mw of 1,000-500,000 is blended as a base resin to formulate a chemically amplified, positive resist composition which has advantages including a significantly enhanced contrast of alkali dissolution rate before and after exposure, high sensitivity, high resolution, a satisfactory pattern profile after exposure, high etching resistance, and process adaptability.