The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2003
Filed:
Jan. 07, 2002
Applicant:
Inventors:
Ching-Yu Chang, I-Lan, TW;
Wei-Ming Chung, Taipei, TW;
Assignee:
Macronix International Co., Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ;
U.S. Cl.
CPC ...
H01L 2/1302 ;
Abstract
A method for pitch reduction is disclosed. The method can form a pattern with a pitch ⅓ the original pitch formed by available photolithography technologies by only using one photo mask or one pattern transfer process, self-aligned etching back processes, and conventional deposition processes. By choosing appropriate layers to be deposited and etched, the pattern can be an etching mask or it can be a device structure itself.