The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
May. 31, 2001
Applicant:
Inventor:
Chi-Yuan Hung, Ilan Hsien, TW;
Assignee:
Macronix International Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
A three dimensional mask can adjust the coherence of radiation passing through an edge pattern on the mask by increasing the thickness of an opaque layer to extend the passing path in the edge pattern, thereby reducing the optical proximity effect (OPE) caused by interference. Therefore, shape distortion and depth of focus (DOF) deficiencies occurring on the edge pattern can be prevented to expose a fine pattern to a photoresist layer.