The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
Apr. 26, 2001
Applicant:
Inventors:
Hitoshi Kato, Kitakami, JP;
Yoshiyuki Fujita, Esashi, JP;
Yukio Tojo, Sagamihara, JP;
Toshitake Tsuda, Sagamihara, JP;
Assignee:
Tokyo Electron Limited, Tokyo-To, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/622 ;
U.S. Cl.
CPC ...
C23C 1/622 ;
Abstract
A thermal processing method of the invention includes; a loading step of loading an object to be processed into a processing container, the object having a surface provided with a silicon film having a minutely irregular profile; and a doping step of introducing phosphorus atoms in the silicon film as impurities, by using PH gas as a doping gas while maintaining a temperature of 550 to 750° C.