The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2003
Filed:
May. 15, 2001
Applicant:
Inventors:
Yoshio Kumagai, Nirasaki, JP;
Takayuki Toshima, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/00 ; B08B 3/04 ; B08B 5/00 ;
U.S. Cl.
CPC ...
B08B 3/00 ; B08B 3/04 ; B08B 5/00 ;
Abstract
The wafers W are dipped and rinsed in pure water in the processing bath and then dichloromethane is fed into the processing bath thereby changing the state of the wafer W from being dipped in pure water to being dipped in dichloromethane. Thereafter, the wafers W is raised up to the drying chamber and dichloromethane remained on the surface of each wafer W is evaporated, and the hot N gas is discharged onto the wafers W. Thereby, no water marks are produced, and no resist is dissolved, and the substrate can be dried in safety.