The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2003
Filed:
Mar. 27, 2002
Arvind Halliyal, Cupertino, CA (US);
Tazrien Kamal, San Jose, CA (US);
Minh Van Ngo, Fremont, CA (US);
Mark T. Ramsbey, Sunnyvale, CA (US);
Jeffrey A. Shields, Sunnyvale, CA (US);
Jean Y. Yang, Sunnyvale, CA (US);
Emmanuil Lingunis, San Jose, CA (US);
Angela T. Hui, Fremont, CA (US);
Jusuke Ogura, Cupertino, CA (US);
Other;
Abstract
A manufacturing method for a MirrorBit® Flash memory includes providing a semiconductor substrate and depositing a charge-trapping dielectric material. First and second bitlines are implanted and a wordline material is deposited. A hard mask material is deposited over the wordline material. The hard mask material is of a material having the characteristic of being deposited rather than grown. A photoresist material is deposited over the wordline material and is patterned to form a patterned hard mask. The patterned photoresist material is removed. The wordline material is processed using the patterned hard mask to form a wordline. The patterned hard mask material is removed.