The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2003
Filed:
Feb. 16, 2001
Applicant:
Inventors:
Tohru Ogawa, Kanagawa, JP;
Hideo Hosono, Kanagawa, JP;
Shinya Kikugawa, Kanagawa, JP;
Yoshiaki Ikuta, Kanagawa, JP;
Akio Masui, Tokyo, JP;
Noriaki Shimodaira, Kanagawa, JP;
Shuhei Yoshizawa, Tokyo, JP;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/772 ; G03B 2/754 ; G03B 2/752 ; G03F 9/00 ;
U.S. Cl.
CPC ...
G03B 2/772 ; G03B 2/754 ; G03B 2/752 ; G03F 9/00 ;
Abstract
An exposure apparatus, wherein at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask and a projection optical system, is made of a synthetic quartz glass for an optical member, which has an absorption coefficient of 0.70 cm or less at a wavelength of 157 nm and an infrared absorption peak attributable to SiOH stretching vibration at about 3640 cm .