The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2003
Filed:
Apr. 12, 2001
Applicant:
Inventors:
Tsunehiro Nishi, Nakakubiki-gun, JP;
Takeshi Kinsho, Nakakubiki-gun, JP;
Shigehiro Nagura, Nakakubiki-gun, JP;
Tomohiro Kobayashi, Nakakubiki-gun, JP;
Satoshi Watanabe, Nakakubiki-gun, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 2/00 ; G03F 7/039 ;
U.S. Cl.
CPC ...
C08F 2/00 ; G03F 7/039 ;
Abstract
A hydrogenated product of a ring-opening metathesis polymer comprising structural units as shown below has improved heat resistance, pyrolysis resistance and light transmission and is suited as a photoresist for semiconductor microfabrication using UV or deep-UV. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.