The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2003
Filed:
Nov. 07, 2002
Michael J. Muilenburg, Minneapolis, MN (US);
Chong-Yong J. Kim, Shoreview, MN (US);
Jerry J. Fizel, River Falls, WI (US);
Richard J. Webb, Inver Grove Heights, MN (US);
John J. Gagliardi, Hudson, WI (US);
Daniel B. Pendergrass, Jr., Mendota Heights, MN (US);
Robert J. Streifel, Woodbury, MN (US);
Wesley J. Bruxvoort, Woodbury, MN (US);
3M Innovative Properties Company, St. Paul, MN (US);
Abstract
A process for planarizing, polishing, or providing other modification of a wafer surface or other workpiece. The process includes using an abrasive article having a textured abrasive coating affixed to a backing. The abrasive article includes a monitoring element, such as a window, to allow transmission of radiation therethrough. The radiation level is monitored throughout the planarization process to determine the approach of the desired endpoint. The window in the abrasive coating can be an area devoid of abrasive coating or having minimal or a thinned abrasive coating.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile