The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2003
Filed:
Sep. 06, 2001
Tsu Shih, Hsin-Chu, TW;
Yung-Cheng Lu, Taipei, TW;
Lih Ping Li, Taipei, TW;
Tien-I Bao, Hsin-Chu, TW;
Chung Chi Ko, Lan-tou, TW;
Taiwan Semiconductor Manufacturing Co., Ltd, Hsin Chu, TW;
Abstract
A method for forming a protective oxide liner to reduce a surface reflectance including providing a hydrophilic insulating layer over a conductive layer; providing an anti-reflectance coating (ARC) layer over the hydrophilic insulating layer; providing an etching stop layer over the anti-reflectance coating (ARC) layer; photolithographically defining a pattern on a surface of the etching stop layer for etching; anisotropically etching at least one etch opening extending at least partially through a thickness of the hydrophilic insulating layer; depositing an oxide liner such that the sidewalls and bottom portion of the at least one etch opening and said surface are covered by the oxide liner; and, removing the oxide liner from aid surface according to a chemical mechanical (CMP) process to a surface reflectance.