The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2003
Filed:
Jun. 07, 2000
Applicant:
Inventors:
Tetsuji Togawa, Kanagawa-ken, JP;
Kuniaki Yamaguchi, Kanagawa-ken, JP;
Nobuyuki Takada, Kanagawa-ken, JP;
Satoshi Wakabayashi, Kanagawa-ken, JP;
Assignee:
Ebara Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 7/00 ;
U.S. Cl.
CPC ...
B24B 7/00 ;
Abstract
Disclosed is a dressing apparatus wherein a polishing surface can be regenerated stably over a long period without any danger of an object to be polished being scratched. A dressing surface of a dresser is caused to slide on a polishing surface of a polishing table while the dressing surface is urged against the polishing surface. The dressing surface is formed from a grindstone