The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2003
Filed:
May. 02, 2001
Applicant:
Inventors:
Ming-Chung Liang, Pingtung, TW;
Shin-Yi Tsai, Hsinchu, TW;
Assignee:
Macronix International Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/00 ;
U.S. Cl.
CPC ...
B08B 3/00 ;
Abstract
An apparatus for cleaning a semiconductor wafer is disclosed to substantially improve the efficiency of the cleaning process, and reduce the quantity of cleaning solvent used. The apparatus includes a rotating table for supporting the wafer, a rotation device to rotate the rotation table, a movable or stationary curved-slab for scrubbing the surface of the wafer efficiently, a cleaning nozzle for applying a cleaning solvent or stripper on the surface of the wafer, and a resistance wall for preventing the cleaning solvent spun out from the wafer to pollute the cleaning room.