The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2003
Filed:
Nov. 29, 2001
Yaw S. Obeng, Orlando, FL (US);
Edward M. Yokley, Pembroke Pines, FL (US);
PsiloQuest, Winter Park, FL (US);
Abstract
The present invention is directed, in general, to a polymer with altered properties to make the pad more suitable for use in customized semiconductor, in particular, shallow trench isolation chemical mechanical polishing applications. A method of preparing such polymers comprises exposing a plastic substrate to a supercritical fluid containing a precursor. By virtue of the reactive environment provided by the supercritical fluid, the precursor is grafted throughout the plastic, thereby changing its bulk properties. A wide variety of grafted compounds, including inorganic, wetability and inorganic-organic compounds, may thus be incorporated into the plastic to form a new polymer endowed with new set of favorable polishing properties.