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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6593578 B1

PDFFull Text
Date of Patent:
Jul. 15, 2003

Filed:

Nov. 08, 2001

Wien filter for use in a scanning electron microscope or the like

Applicant:
Inventors:

Paul J. Duval, Lexington, MA (US);

Allan I. Rubin, Newton, MA (US);

Ira Rosenberg, Andover, MA (US);

Vladimir Vayner, Needham, MA (US);

Neal T. Sullivan, Lunenburg, MA (US);

Assignee:

Schlumberger Technologies, Inc., San Jose, CA (US);

Attorney:

Cohen, Pontani, Lieberman & Pavane

Primary Examiner:

John R Lee

Assistant Examiner:

Erin-Michael Gill

Int. Cl.
CPC ...
H01F 7/00 ;
U.S. Cl.
CPC ...
H01F 7/00 ;
Abstract

A charged particle filter such as a Wien filter in which components used as the pole pieces and electrodes are precisely and reliably secured to a supporting structure through which they extend and to which they are brazed. Electrical insulating gaps in the magnetic circuit are located very remotely from the pole faces of the pole pieces so as to minimize any adverse effect of the gaps on the produced magnetic field.

Find Patent Forward Citations

Duval, Paul. (2003). Wien filter for use in a scanning electron microscope or the like (U.S. Patent No. 6593578). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6593578

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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