The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2003
Filed:
Jan. 11, 2000
Applicant:
Inventors:
Brent A. McClure, Boise, ID (US);
Daryl C. New, Boise, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/900 ; H01L 2/7108 ; H01L 2/976 ; H01L 2/994 ;
U.S. Cl.
CPC ...
H01L 2/900 ; H01L 2/7108 ; H01L 2/976 ; H01L 2/994 ;
Abstract
Semiconductor structures formed using redeposition of an etchable layer. A starting material is etched and redeposited during the etch on a sidewall of a foundation. The foundation may be removed or may form an integral part of the structure. The starting material may contain one or more layers of material. The structures are adapted for a variety of capacitor structures.