The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2003
Filed:
Aug. 18, 2000
Applicant:
Inventors:
You Wang, Cupertino, CA (US);
Arnold Kholodenko, San Francisco, CA (US);
Shamouil Shamouilian, San Jose, CA (US);
Alexander M. Veytser, Mountain View, CA (US);
Wing L. Cheng, Sunnyvale, CA (US);
Assignee:
Applied Materials Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01G 3/00 ; H01T 2/300 ;
U.S. Cl.
CPC ...
H01G 3/00 ; H01T 2/300 ;
Abstract
A chamber for processing a substrate comprises a support including an electrode at least partially covered by a dielectric that is permeable to electromagnetic energy. The electrode may be chargeable to electrostatically hold the substrate , to couple energy to a gas in the chamber , or both. A base below the support comprises a slot that may be adapted to serve as a thermal expansion slot to reduce thermal stresses.