The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2003

Filed:

Sep. 12, 2000
Applicant:
Inventors:

Ming-Dou Ker, Hsinchu, TW;

Tung-Yang Chen, Hsinchu, TW;

Hun-Hsien Chang, Taipei Hsien, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/362 ;
U.S. Cl.
CPC ...
H01L 2/362 ;
Abstract

In this invention, a novel substrate-triggered technique is proposed to effectively improve the electrostatic discharge (ESD) robustness of integrated circuit (IC) products. The ESD protection circuit derived from the substrate-triggered technique is comprised of a metal-oxide-semiconductor (MOS) transistor and an ESD detection circuit. The MOS transistor is composed of a bulk region, a gate, a source region coupled to a power rail, and a drain region couple to a pad. The source region, the bulk region and the drain region further construct a parasitic bipolar junction transistor (BJT) The ESD detection circuit is located between, and connected to, the power rail and the pad. During normal operation, the ESD detection circuit maintains the coupling of the bulk region to the first power rail. During an ESD event, the ESD detection circuit biases the bulk region to trigger the BJT thereby releasing ESD stress. Research and experiment demonstrate the substrate-triggered technique can substantially improve the ESD protection level of an MOS transistor.


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