The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2003
Filed:
Jan. 15, 2002
Applicant:
Inventors:
Yung-Tai Hung, Chiayi, TW;
Chi-Tung Huang, Hsinchu, TW;
Assignee:
Macronix International Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 2/118 ;
U.S. Cl.
CPC ...
B24B 2/118 ;
Abstract
A wafer carrier used for a chemical mechanical device has a polishing head and a pad conditioner. The polishing head has a retainer ring secured to a bottom of the polishing head to hold a wafer. The pad conditioner can be fixed on a surface of the retainer ring, attached to side surfaces of the retainer ring, or embedded in the retainer ring, such that the pad conditioner and the polishing head can be integrally formed.
Hung, Yung-Tai. (2003). Wafer carrier used for chemical mechanic polishing (U.S. Patent No. 6565705). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6565705
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile