The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2003

Filed:

May. 29, 2001
Applicant:
Inventors:

Adrian John Murrell, West Sussex, GB;

Erik Jan Hilda Collart, West Sussex, GB;

Bernard Francis Harrison, West Sussex, GB;

Amir Al-Bayati, San Jose, CA (US);

Chris James Burgess, East Sussex, GB;

David Armour, Salford, GB;

Andrew Holmes, Oxon, GB;

Simon Povall, West Sussex, GB;

Drew Arnold, San Jose, CA (US);

Paul Anthony Burfield, West Sussex, GB;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 3/715 ;
U.S. Cl.
CPC ...
H01J 3/715 ;
Abstract

An ion beam generation apparatus comprising an ion source ( ) for generating ions, and a tetrode extraction assembly ( ) comprising four electrodes for extracting and accelerating ions from the ion source. The extraction assembly comprises a source electrode ( ) at the potential of the ion source, an extraction electrode ( ) adjacent to the source electrode to extract ions from the ion source ( ), a ground electrode ( ), and a suppression electrode ( ) between the extraction electrode and the ground electrode. Each electrode has an aperture to allow the ion beam to pass therethrough. The gap between the extraction ( ) and suppression ( ) electrodes is variable in the direction of ion beam travel.


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