The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2003

Filed:

Oct. 26, 2000
Applicant:
Inventors:

David Scheiner, Ganei-Yehuda, IL;

Avi Ravid, Kfar-Saba, IL;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 1/102 ;
U.S. Cl.
CPC ...
G01B 1/102 ;
Abstract

A method for measuring at least one desired characteristic of a patterned article is presented. The article is of a kind containing a plurality of different pattern elements located at different sites, each including a stack of layers. An optical model is provided, which is based on a set of parameters corresponding to predetermined characteristics of the article, and is capable of generating theoretical data indicative of spectral response of the article. The set of parameters includes parameters corresponding to geometrical characteristics of the pattern elements. Reference data is prepared containing a plurality of sets of parameters for at least some of the different pattern elements. A spectral measurement of light response is carried out at a selected site of the patterned article and measured data is generated. By varying said parameters' sets, the optical model is optimized, and then the theoretical spectral responses obtained through the optimized optical model and from the measured data is analyzed to determine therefrom the at least one desired characteristic.


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