The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2003
Filed:
Nov. 15, 2000
Mutsunori Igarashi, Kanagawa-ken, JP;
Masami Murakata, Kanagawa-ken, JP;
Takashi Mitsuhashi, Kanagawa-ken, JP;
Masaaki Yamada, Kanagawa-ken, JP;
Fumihiro Minami, Kanagawa-ken, JP;
Takashi Ishioka, Kanagawa-ken, JP;
Kabushiki Kaisha Toshiba, , JP;
Abstract
With an automatic layout method, a first line having a firs line width is generated in a prescribed direction. A second line having a second line width and extending at an oblique angle with respect to the first line is generated, so that the second line terminates at an end portion of the first line with an overlapped area. One or more VIA patterns are read out of a database according to the shape of the overlapped area. The VIA patterns are placed in the overlapped area, so that one of the VIA patterns is located at the intersection of the center lines of the first and second lines. The VIA pattern is a combination of parallelograms, including squares and rectangles.