The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2003
Filed:
Mar. 07, 2000
Michael A. Marcus, Honeoye Falls, NY (US);
Jiann-Rong Lee, Webster, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method of processing interferometric data relating to a sample having multiple reflective surfaces, includes the steps of: specifying a set of acceptance ranges for peaks of interest in the interferogram, based on a knowledge of the sample; determining which peaks in the interferogram fall within the acceptance ranges; identifying which peaks within the acceptance ranges represent multiple reflections and eliminating these peaks from the interferometric data; identifying acceptance ranges which do not contain peaks; and employing other peaks in the interferogram to calculate the locations of peaks in the acceptance ranges that do not contain peaks.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile