The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2003

Filed:

Nov. 30, 2000
Applicant:
Inventors:

Chi-Ming Huang, Hsinchu Hsien, TW;

Shuang-Neng Peng, Taipei Hsien, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 7/00 ;
U.S. Cl.
CPC ...
B24B 7/00 ;
Abstract

A multi-functional conditioner set for a chemical-mechanical polishing station. The multi-functional conditioner set has at least two conditioning heads each made from a different material such as diamond dust and nylon. The multi-functional conditioner set also includes an ejection tube for delivering chemical agents and de-ionized water to the conditioning heads. Moreover, a vibrator is attached to the ejection tube to transmit ultrasonic or megasonic vibration to the chemical agents and de-ionized water. The conditioning heads can be arranged in various combinations and the ejection tube set to various control settings. Hence, a polishing pad can be cleaned or reconditioned and residual diamond particles on the polishing pad can be removed. Furthermore, the conditioner set occupies only a single area above the polishing table of the polishing station.


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Huang, Chi-Ming. (2003). Conditioner set for chemical-mechanical polishing station (U.S. Patent No. 6514127). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6514127

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