The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2003
Filed:
Mar. 26, 2002
Applicant:
Inventors:
Ming-Chung Liang, Taipei, TW;
Shin-Yi Tsai, Hsinchu, TW;
Assignee:
Macronix International Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/14763 ;
U.S. Cl.
CPC ...
H01L 2/14763 ;
Abstract
The present invention generally relates to provide a fabrication method for forming a rounded corner of a contact window or a via by using a two-step light etching technique. In the present invention, after the etching process to form the contact window or the via, an object of the invention is to utilize oxygen plasma and fluorocarbon plasma of the two-step light etching technique to produce the rounded corner of the window or via so as this rounded opening profile of the contact window or the via can supply for following metal-filling processes.