The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2003

Filed:

Feb. 07, 2001
Applicant:
Inventors:

Erik R. Loopstra, Heeze, NL;

Yim Bun P. Kwan, Eindhoven, NL;

Marcel J. E. H. Muitjens, Nuth, NL;

Sonja T. De Vrieze-Voorn, Bakel, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ;
U.S. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ;
Abstract

In a lithographic projection apparatus a first part is shielded from a second part by a heat shield. The first part is required to have a temperature of a predetermined value and the second part has a characteristic that may influence the temperature of the first part. The characteristic may be a temperature deviating from the predetermined value, or a supply of radiation that may deviate the temperature of the first part from the predetermined value when incident on the first part. Heat shield temperature controlling means are provided to control a temperature of the heat shield to the predetermined value.


Find Patent Forward Citations

Loopstra, Erik. (2003). Lithographic projection apparatus having a temperature controlled heat shield (U.S. Patent No. 6509951). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6509951

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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