The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2003
Filed:
Sep. 10, 2001
Applicant:
Inventor:
Takeshi Sakuma, Tsukui-gun, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C 5/00 ;
U.S. Cl.
CPC ...
B05C 5/00 ;
Abstract
A CVD apparatus includes a process chamber connected to a process chamber through a connection path. A window made of a light transmission material is disposed in a wall that defines the excitation chamber. A light source is disposed outside the excitation chamber to face the window. The light source irradiates a flow of a process gas with light through the window, thereby exciting the process gas. A surface purge system is arranged to supply a purge gas along the inner surface of the window. The surface purge system has a purge gas port open to the excitation chamber.
Published as: