The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2002
Filed:
Jun. 28, 2001
Chihiro Taguchi, Kofu, JP;
Ryo Nonaka, Nakakoma-gun, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
The present invention is constituted of a lower electrode structure ( ) comprising a base table ( ) formed of a conductive material, an electrostatic adsorption member ( ) formed on the base table ( ) and having a dielectric layer ( ) on which the substrate to be mounted and within which an electrode ( ) electrically isolated from the base table ( ) is housed, first wiring ( ) having an end connected to the electrode ( ) of the electrostatic adsorption member, a direct-current source ( ) connected to the other end of the first wiring ( ), second wiring ( ) having an end connected to the base table ( ), a high frequency source ( ) connected to the other end of the second wiring ( ), a third wiring ( ) for connecting the first wiring ( ) and the second wiring ( ), and a capacitor ( ) formed on the third wiring ( ). Plasma processing is performed by disposing the lower electrode structure ( ) in the chamber ( ).