The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2002
Filed:
Jan. 22, 2001
Frederick N. Hause, Austin, TX (US);
Karsten Wieczorek, Reichenberg-Boxdorf, DE;
Manfred Horstmann, Dresden, DE;
Advanced Micro Devices, Inc., Austin, TX (US);
Abstract
The method disclosed herein comprises initially providing a tool comprised of a process chamber, a lid above the process chamber, an RF coil for assisting in generating a plasma in the chamber, a substrate support, and a power supply coupled to the substrate support. The method continues with the step of positioning a substrate in the tool adjacent the substrate support, introducing a noble gas into the chamber, and forming a layer of material above the substrate by sputtering the lid material by performing at least the following steps: applying approximately 200-300 watts of power to the RF coil at a frequency of approximately 400 KHz and applying approximately 20-60 watts of power to the substrate at a frequency of approximately 13.56 MHz.