The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2002

Filed:

Nov. 29, 1999
Applicant:
Inventors:

Kadthala R. Narendrnath, San Jose, CA (US);

Syed H. Askari, San Jose, CA (US);

Dennis S. Grimard, Ann Arbor, MI (US);

Surinder S. Bedi, Fremont, CA (US);

Ananda H. Kumar, Milpitas, CA (US);

Shamouil Shamouilian, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H02N 1/300 ;
U.S. Cl.
CPC ...
H02N 1/300 ;
Abstract

A chamber for processing a substrate comprises a support comprising a dielectric enveloping an electrode The electrode may be chargeable to electrostatically hold the substrate or may be chargeable to form an energized gas in the chamber to process the substrate A base is below the support and a compliant member is positioned between the support and the base The compliant member may be adapted to alleviate thermal stresses arising from a thermal expansion mismatch between the dielectric and the base


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