The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2002
Filed:
Apr. 04, 2000
Applicant:
Inventors:
Mingming Fang, Naperville, IL (US);
Shumin Wang, Naperville, IL (US);
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 1/00 ; B44C 1/22 ;
U.S. Cl.
CPC ...
B24B 1/00 ; B44C 1/22 ;
Abstract
A method of planarizing or polishing the surface of a memory or rigid disk comprising abrading at least a portion of the surface with (i) a polishing composition comprising an oxidizing agent selected from the group consisting of persulfates and peroxides, an amino acid, and water, and (ii) an abrasive.
Fang, Mingming. (2002). Method for polishing a memory or rigid disk with an amino acid-containing composition (U.S. Patent No. 6471884). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6471884
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile