The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2002
Filed:
Oct. 28, 1999
Masaru Kasai, Zama, JP;
Shibaura Mechatronics Corporation, Yokohama, JP;
Abstract
A vacuum processing apparatus produces fluorine radicals by activating a fluorinating gas containing at least fluorine atoms and fluorinates the surface of a component formed of an organic material ( ) exposed to an atmosphere of a processing chamber ( ) before carrying an object (S) into the processing chamber ( ). The object (S) is carried into the processing chamber ( ) after the completion of a fluorinating process. The object (S) is processed with a processing gas containing at least oxygen radicals. Etching of the component formed of the organic material ( ) can be prevented by the fluorination of surface of the component formed of the organic material ( ) and exposed to an atmosphere in the processing chamber ( ).