The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2002
Filed:
Oct. 13, 2000
Hsiao-Che Wu, Taoyuan, TW;
ProMos Technologies, Inc., Hsin-Chu, TW;
Abstract
A sputter cleaning system and method are described which provide improved temperature control of the pedestal and thus of a substrate being sputter cleaned. The sputter cleaning system comprises a conducting metal pedestal to provide a conducting surface beneath a substrate being sputter processed. A cooling channel is formed in the metal pedestal. In one example the cooling channel typically is made up of a number of concentric, interconnected, circular cooling sub-channels. Other shape cooling channels, such as radial, can also be used. An inlet tube delivers a cooling liquid, such as water, to the cooling channel and an exhaust tube removes the cooling liquid from the cooling channel thereby removing heat from the pedestal. The cooling liquid removes heat from the pedestal, thereby controlling the temperature of the pedestal and the substrate undergoing sputter cleaning.