The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2002
Filed:
Dec. 14, 1999
Hamid Noorbakhsh, Fremont, CA (US);
Michael Welch, Livermore, CA (US);
Siamak Salimian, Sunnyvale, CA (US);
Paul Luscher, Sunnyvale, CA (US);
Hongching Shan, San Jose, CA (US);
Kaushik Vaidya, Sunnyvale, CA (US);
Jim Carducci, Sunnyvale, CA (US);
Evans Lee, Milpitas, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A plasma reactor embodying the invention includes a wafer support and a chamber enclosure member having an interior surface generally facing the wafer support. At least one miniature gas distribution plate for introducing a process gas into the reactor is supported on the chamber enclosure member and has an outlet surface which is a fraction of the area of the interior surface of said wafer support. A coolant system maintains the chamber enclosure member at a low temperature, and the miniature gas distribution plate is at least partially thermally insulated from the chamber enclosure member so that it is maintained at a higher temperature by plasma heating.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile