The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2002
Filed:
Jul. 13, 1999
Akio Yamada, Tokyo, JP;
Tatsuro Ohkawa, Tokyo, JP;
Advantest Corporation, Tokyo, JP;
Abstract
A charged particle beam exposure apparatus capable of detecting a partial unevenness and adjusting the height of the surface of a specimen to be exposed is disclosed. This charged particle beam exposure apparatus comprises a charged particle beam source, a charged particle beam shaper, a deflector for changing the position where the charged particle beam is radiated on the specimen, a projector for projecting the charged particle beam on the specimen, and a control unit for controlling the deflector and the projector at the time of exposure. A pattern is plotted on the specimen by the charged particle beam being converged and deflected appropriately. The apparatus further comprises a stage for moving the specimen within the apparatus, and a height measuring unit for measuring the height distribution in a predetermined range of the specimen with at least a predetermined density while the specimen is loaded in the apparatus.