The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2002

Filed:

Mar. 28, 2001
Applicant:
Inventors:

Uway Tseng, Tai-Chung Hsien, TW;

Kent Kuohua Chang, Taipei, TW;

Wen-Pin Lu, Yi-Lan, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/1322 ; H01L 2/9788 ;
U.S. Cl.
CPC ...
H01L 2/1322 ; H01L 2/9788 ;
Abstract

A method of gettering layer for improving chemical mechanical polishing process in flash-memory production is provided to protect a memory element against baking and keep its reliability by blockading mobile electrons with the gettering layer. Moreover, by taking advantage of the gettering layer, reduction of the thickness of the ILD for increasing the etching margin, the deposition margin, and the remaining margin of oxides are made possible.


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