The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2002
Filed:
Oct. 25, 2000
Applicant:
Inventors:
Chung-Peng Hao, Taipei, TW;
Chung-Lin Huang, Taichung, TW;
Chung-Yuan Lee, Taoyuan, TW;
Yih-Ren Shao, Hsien, TW;
Pei-Ing Lee, Taipei Hsien, TW;
Assignee:
Nanya Technology Corp., , TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ;
U.S. Cl.
CPC ...
H01L 2/1302 ;
Abstract
A shallow trench isolation having an etching stop layer and its method of fabrication. The method utilizes a shield layer such as a silicon nitride layer to serve as an etching stop layer. The etching stop layer is formed in the top position of the shallow trench isolation.