The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2002
Filed:
Jul. 25, 2001
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing apparatus ( ) for processing wafers (W) has a first processing chamber ( ) capable of containing the wafers (W) and a second processing chamber ( ) capable of containing the wafers (W). The second processing chamber ( ) is formed below and near the first processing chamber ( ) and is capable of communicating with the first processing chamber ( ). A wafer guide ( ) carries the wafers (W) vertically between the first and second processing chambers ( ). A shutter ( ) is opened to allow the first and second processing chambers ( ) to communicate with each other and is closed to isolate the same from each other. A steam supply system ( ) including steam supply port, an ozone gas supply system ( ) including ozone gas supply port and an IPA supply system ( ) including IPA supply port are combined with the first processing chamber ( ). A pure water supply system ( ) including pure water supply port and a draining unit ( ) including a drain pipe-line ( ) through which pure water is drained are combined with the second processing chamber ( ).