The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2002

Filed:

Apr. 06, 2001
Applicant:
Inventors:

Chih-Cheng Liu, Taipei, TW;

Der-Yuan Wu, Hsin-Chu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 1/100 ;
U.S. Cl.
CPC ...
G11C 1/100 ;
Abstract

The array includes: a plurality of pseudo spin valve (PSV) cells; a plurality of parallel bit lines, wherein a plurality of bit lines are straight lines and located under the plurality of pseudo spin valve (PSV) cells; a plurality of parallel word lines, wherein a plurality of word lines are continuous-bended lines having a first straight line, a second straight line and a third straight line. These straight lines of the word lines are orthogonal each other, wherein the first straight line and the third straight line are parallel. The first straight line and the third straight line are individually orthogonal with the direction of the bit lines. Furthermore, the second straight lines of the word lines are individually located on the pseudo spin valve (PSV) cells, and the second straight lines are parallel with the direction of the bit lines, so as to increase the magnetresistance ratio.


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