The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2002

Filed:

Apr. 06, 2001
Applicant:
Inventors:

Cheng-Yuan Tsai, Yun-Lin, TW;

Ming-Sheng Yang, Hsin-Chu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/14763 ;
U.S. Cl.
CPC ...
H01L 2/14763 ;
Abstract

A method for improving surface wettability of inorganic low dielectric material is disclosed. The method includes an inorganic dielectric material as a low-k dielectric barrier layer is spun-on the semiconductor device. Then, inorganic dielectric material surface is treated by ultraviolet (UV) treatment that the surface characteristic of inorganic dielectric material is changed from hydrophobic to hydrophilic. Thus, the surface wettability of inorganic dielectric material can be improved and adhesion ability between the inorganic dielectric material and organic polymer can be increased.


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