The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2002
Filed:
Dec. 11, 2000
Applicant:
Inventors:
Terence M. Thomas, Newark, DE (US);
Craig D. Lack, Wilmington, DE (US);
Steven P. Goehringer, Newark, DE (US);
Assignee:
Rodel Holdings, Inc., Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 3/14 ; C09G 1/02 ; C09G 1/04 ;
U.S. Cl.
CPC ...
C09K 3/14 ; C09G 1/02 ; C09G 1/04 ;
Abstract
This invention provides a polishing composition with a stable pH for use in CMP of semiconductor substrates comprising: high-purity submicron particles of a metal oxide and a soluble metal salt of the metal oxide. The metal salt is present in a proportionate amount to adjust the aqueous concentration of metal ions to the equilibrium solubility of the metal oxide at the desired pH of the polishing composition.
Quick Actions:
Thomas, Terence. (2002). Polishing compositions for semiconductor substrates (U.S. Patent No. 6379406). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6379406
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile