The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2002

Filed:

Apr. 27, 2000
Applicant:
Inventors:

Guoguang Li, San Jose, CA (US);

Dale A. Harrison, Tracy, CA (US);

Abdul Rahim Forouhi, Cupertino, CA (US);

Assignee:

N & K Technology, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/11 ;
U.S. Cl.
CPC ...
G02B 1/11 ;
Abstract

A graded anti-reflective coating (ARC) with one or more layers has a bottom layer that is highly absorbing at the lithographic wavelength, and one or more layers between the substrate and the resist layer having inhomogeneous optical constants. The refractive indices are matched across layer interfaces, and the optical constants vary smoothly through the layer thicknesses. In each layer the extinction coefficient and the refractive index have independently selectable values and gradients. This ARC structure provides almost total absorption in the bottom layer and near-zero reflection at the resist interface and all other intermediate interfaces. Layers are preferably of inorganic materials, typically SiO N . Because of its highly absorbing bottom layer, an ARC according to an embodiment of the present invention works effectively over diverse substrate materials for a variety of lithographic wavelengths. It provides great latitude of manufacturing tolerances for thicknesses and optical constants.


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